Modeling crack patterns by modified stit tessellations

Roberto León, Werner Nagel, Joachim Ohser, Steve Arscott

Producción científica: Contribución a una revistaArtículorevisión exhaustiva

4 Citas (Scopus)

Resumen

Random planar tessellations are presented which are generated by subsequent division of their polygonal cells. The purpose is to develop parametric models for crack patterns appearing at length scales which can change by orders of magnitude in areas such as nanotechnology, materials science, soft matter, and geology. Using the STIT tessellation as a reference model and comparing with phenomena in real crack patterns, three modifications of STIT are suggested. For all these models a simulation tool, which also yields several statistics for the tessellation cells, is provided on the web. The software is freely available via a link given in the bibliography of this article. The present paper contains results of a simulation study indicating some essential features of the models. Finally, an example of a real fracture pattern is considered which is obtained using the deposition of a thin metallic film onto an elastomer material-the results of this are compared to the predictions of the model.

Idioma originalInglés
Número de artículo2245
Páginas (desde-hasta)33-46
Número de páginas14
PublicaciónImage Analysis and Stereology
Volumen39
N.º1
DOI
EstadoPublicada - 2020

Áreas temáticas de ASJC Scopus

  • Biotecnología
  • Procesamiento de senales
  • Matemáticas General
  • Ciencia de los materiales (miscelánea)
  • Instrumental
  • Radiología, medicina nuclear y obtención de imágenes
  • Acústica y ultrasonidos
  • Visión artificial y reconocimiento de patrones

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