TY - JOUR
T1 - First-principles calculations of the thermal stability of Ti 3SiC2(0001) surfaces
AU - Orellana, Walter
AU - Gutiérrez, Gonzalo
N1 - Funding Information:
This work was supported by the Air Force Office of Scientific Research under Grant FA9550-06-1-0540 . We also thank the Anillo Bicentenario project ACT24/2006. WO acknowledges the Universidad Andres Bello Grant DI-02-11/R , and GG the Universidad de Chile Grant ENL 10/06 .
PY - 2011/12
Y1 - 2011/12
N2 - The energetic, thermal stability and dynamical properties of the ternary layered ceramic Ti3SiC2(0001) surface are addressed by density-functional theory calculations and molecular dynamic (MD) simulations. The equilibrium surface energy at 0 K of all terminations is contrasted with thermal stability at high temperatures, which are investigated by ab initio MD simulations in the range of 800 to 1400 °C. We find that the toplayer (sublayer) surface configurations: Si(Ti2) and Ti2(Si) show the lowest surface energies with reconstruction features for Si(Ti2). However, at high temperatures they are unstable, forming disordered structures. On the contrary, Ti1(C) and Ti2(C) despite their higher surface energies, show a remarkable thermal stability at high temperatures preserving the crystalline structures up to 1400 °C. The less stable surfaces are those terminated in C atoms, C(Ti1) and C(Ti2), which at high temperatures show surface dissociation forming amorphous TiCx structures. Two possible atomic scale mechanisms involved in the thermal stability of Ti3SiC2(0001) are discussed.
AB - The energetic, thermal stability and dynamical properties of the ternary layered ceramic Ti3SiC2(0001) surface are addressed by density-functional theory calculations and molecular dynamic (MD) simulations. The equilibrium surface energy at 0 K of all terminations is contrasted with thermal stability at high temperatures, which are investigated by ab initio MD simulations in the range of 800 to 1400 °C. We find that the toplayer (sublayer) surface configurations: Si(Ti2) and Ti2(Si) show the lowest surface energies with reconstruction features for Si(Ti2). However, at high temperatures they are unstable, forming disordered structures. On the contrary, Ti1(C) and Ti2(C) despite their higher surface energies, show a remarkable thermal stability at high temperatures preserving the crystalline structures up to 1400 °C. The less stable surfaces are those terminated in C atoms, C(Ti1) and C(Ti2), which at high temperatures show surface dissociation forming amorphous TiCx structures. Two possible atomic scale mechanisms involved in the thermal stability of Ti3SiC2(0001) are discussed.
KW - Ab initio molecular dynamics
KW - MAX phases
KW - Thermal stability
UR - http://www.scopus.com/inward/record.url?scp=80053574578&partnerID=8YFLogxK
U2 - 10.1016/j.susc.2011.08.011
DO - 10.1016/j.susc.2011.08.011
M3 - Article
AN - SCOPUS:80053574578
SN - 0039-6028
VL - 605
SP - 2087
EP - 2091
JO - Surface Science
JF - Surface Science
IS - 23-24
ER -